DESTRUCTION MECHANISMS FOR FORMALDEHYDE IN ATMOSPHERIC-PRESSURE LOW-TEMPERATURE PLASMAS

Formaldehyde (CH2O) is a common pollutant of indoor air in residences and commercial buildings. The removal of CH2O from atmospheric pressure gas streams (N2/O2/H2O/CH2O) using plasmas generated by a dielectric barrier discharge has been theoretically investigated with the goal of cleansing indoor air. The model consists of a full accounting of the electron, ion, and neutral chemical kinetics in contaminated humid air. We find that the destruction of CH2O results dominantly from chemical attack by OH and O radicals, with the primary end products being CO and H2O. The predicted destruction rates for CH2O are typically 2-8 ppm/(mJ cm-3) (parts per million of CH2O in air/energy deposition). The elimination of the unwanted byproducts, CO and NO, using a platinum catalyst is discussed.