STUDY ON INSITU CARBON COATING IN JIPP T-IIU

被引:16
作者
NODA, N
HORI, Y
MASAI, K
OGAWA, Y
HIROKURA, S
KAKO, E
TANIGUCHI, Y
KAWAHATA, K
OGAWA, I
ANDO, R
AKIYAMA, R
KAWASUMI, Y
MATSUOKA, K
TOI, K
HAMADA, Y
TANAHASHI, S
WATARI, T
AMEMIYA, S
ISHIKAWA, K
MINAGAWA, H
SATAKE, T
HASHIBA, M
YAMASHINA, T
OKAZAKI, K
OYAMA, H
ISHIBE, Y
YANO, K
SAKAMOTO, Y
机构
[1] NAGOYA UNIV, DEPT NUCL ENGN, NAGOYA, AICHI 464, JAPAN
[2] NAGOYA UNIV, INST PLASMA PHYS, NAGOYA, AICHI 464, JAPAN
[3] HOKKAIDO UNIV, DEPT NUCL ENGN, SAPPORO, HOKKAIDO 060, JAPAN
[4] INST PHYS & CHEM RES, SAITAMA 35101, JAPAN
关键词
D O I
10.1016/0022-3115(87)90429-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:709 / 712
页数:4
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