CHEMICAL CLEANING OF METAL-SURFACES IN VACUUM-SYSTEMS BY EXPOSURE TO REACTIVE GASES

被引：54

作者：

GRUNZE, M ^{[1
]}

RUPPENDER, H ^{[1
]}

ELSHAZLY, O ^{[1
]}

机构：

[1] UNIV MAINE,DEPT PHYS & ASTRON,ORONO,ME 04469

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575688

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：1266 / 1275

页数：10

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