HIGH-PRECISION X-RAY METROLOGY

被引：11

作者：

SEYFRIED, P

BECKER, P

WINDISCH, D

机构：

[1] Physikalisch-Technische, Bundesanstalt, Braunschweig, West, Ger, Physikalisch-Technische Bundesanstalt, Braunschweig, West Ger

来源：

PRECISION ENGINEERING-JOURNAL OF THE AMERICAN SOCIETY FOR PRECISION ENGINEERING | 1988年 / 10卷 / 01期

关键词：

INTERFEROMETRY - SILICON AND ALLOYS;

D O I：

10.1016/0141-6359(88)90093-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Highly pure silicon crystals with almost perfect lattice structure constitute a powerful metrological tool. Lattice spacings of the order of 0. 1 nm are reproduced by nature to better than 1 part in 10**7. These have been applied as length standards in the sub-nanometer region using the scanning x-ray interferometer. Crystallographic angles between different sets of lattice planes within the same crystal differ only very little from values calculated for the perfect crystal. Double-crystal x-ray diffraction has been used to provide a single-crystal polygon.

引用

页码：35 / 42

页数：8