CURRENT-VOLTAGE CHARACTERISTIC OF REACTIVE SPUTTERING WITH ELEMENT TARGETS

被引:7
作者
SALM, J
STEENBECK, K
STEINBEISS, E
机构
[1] Zentralinstitut Für Festkörperphysik Und Werkstofforschung, Akademie Der Wissenschaften Der Ddr, Institutsteil Für Magnetische Werkstoffe
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1979年 / 54卷 / 01期
关键词
D O I
10.1002/pssa.2210540160
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
[No abstract available]
引用
收藏
页码:K23 / K26
页数:4
相关论文
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THIN SOLID FILMS, 1976, 33 (02) :173-183
[2]  
RITTER E, 1964, MONATSH CHEM, V95, P795
[3]   MECHANISM OF RF REACTIVE SPUTTERING [J].
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JOURNAL OF APPLIED PHYSICS, 1975, 46 (08) :3381-3384
[4]   MAGNETRON SPUTTERING - BASIC PHYSICS AND APPLICATION TO CYLINDRICAL MAGNETRONS [J].
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :171-177