EXPERIMENTAL-STUDY OF AERIAL IMAGES IN X-RAY-LITHOGRAPHY

被引:10
作者
GUO, JZY
LEONARD, Q
CERRINA, F
DIFABRIZIO, E
LUCIANI, L
GENTILI, M
FRANK, J
机构
[1] UNIV WISCONSIN MADISON,CTR X-RAY LITHOG,STOUGHTON,WI 53589
[2] NATL COUNCIL RES,IESS,ROME,ITALY
[3] SEMATECH,AUSTIN,TX 78741
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1993年 / 11卷 / 06期
关键词
D O I
10.1116/1.586558
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Depth-of-focus (gap latitude in proximity lithography) and exposure latitude are the two most important figures-of-merit for linewidth control in lithography. In a recent article, the preliminary result of the experimental verification of this theoretical study was presented-the linewidth variation as a function of gap. In this article, the experimental results of the exposure latitude are presented and discussed. Excellent agreement between experimental and simulation results are found. Optimized parameters based on verified model are presented here.
引用
收藏
页码:2902 / 2905
页数:4
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