共 5 条
- [1] VERIFICATION OF PARTIALLY COHERENT-LIGHT DIFFRACTION MODELS IN X-RAY-LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 3207 - 3213
- [2] GUO JZY, 1993, IBM J RES DEV MAR
- [3] GUO JZY, 1992, P SPIE, V1671
- [4] USE OF A PI-PHASE SHIFTING X-RAY MASK TO INCREASE THE INTENSITY SLOPE AT FEATURE EDGES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 150 - 153
- [5] EFFECT OF MASK ABSORBER THICKNESS ON X-RAY-EXPOSURE LATITUDE AND RESOLUTION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2881 - 2887