EXPERIMENTAL-STUDY OF AERIAL IMAGES IN X-RAY-LITHOGRAPHY

被引：10

作者：

GUO, JZY

LEONARD, Q

CERRINA, F

DIFABRIZIO, E

LUCIANI, L

GENTILI, M

FRANK, J

机构：

[1] UNIV WISCONSIN MADISON,CTR X-RAY LITHOG,STOUGHTON,WI 53589

[2] NATL COUNCIL RES,IESS,ROME,ITALY

[3] SEMATECH,AUSTIN,TX 78741

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1993年 / 11卷 / 06期

关键词：

D O I：

10.1116/1.586558

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Depth-of-focus (gap latitude in proximity lithography) and exposure latitude are the two most important figures-of-merit for linewidth control in lithography. In a recent article, the preliminary result of the experimental verification of this theoretical study was presented-the linewidth variation as a function of gap. In this article, the experimental results of the exposure latitude are presented and discussed. Excellent agreement between experimental and simulation results are found. Optimized parameters based on verified model are presented here.

引用

页码：2902 / 2905

页数：4

共 5 条

[1] VERIFICATION OF PARTIALLY COHERENT-LIGHT DIFFRACTION MODELS IN X-RAY-LITHOGRAPHY
GUO, JZY
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[2] GUO JZY, 1993, IBM J RES DEV MAR
[3] GUO JZY, 1992, P SPIE, V1671
[4] USE OF A PI-PHASE SHIFTING X-RAY MASK TO INCREASE THE INTENSITY SLOPE AT FEATURE EDGES
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ANDERSON, EH
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[5] EFFECT OF MASK ABSORBER THICKNESS ON X-RAY-EXPOSURE LATITUDE AND RESOLUTION
MCCORD, MA
WAGNER, A
SEEGER, D
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2881 - 2887

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