CONDUCTIVITY AND MOBILITY IN VERY THIN EPITAXIAL NISI2 LAYERS

被引：14

作者：

HENZLER, M

ADAMSKI, C

RONNER, K

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期

关键词：

D O I：

10.1116/1.574933

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2127 / 2130

页数：4

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