THE GROWTH OF THIN-FILMS WITH HIGH THICKNESS UNIFORMITY USING ULTRAHIGH-VACUUM MOLECULAR-BEAM DEPOSITION

被引：4

作者：

HALE, CH ^{[1
]}

MUIRHEAD, IT ^{[1
]}

FISHER, SP ^{[1
]}

ORR, JS ^{[1
]}

MATHEW, JGH ^{[1
]}

PRIOR, KA ^{[1
]}

WALKER, AC ^{[1
]}

SMITH, SD ^{[1
]}

机构：

[1] HERIOT WATT UNIV,DEPT PHYS,EDINBURGH EH14 4AS,MIDLOTHIAN,SCOTLAND

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1990年 / 8卷 / 06期

关键词：

D O I：

10.1116/1.576424

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Micrometer thick layers of ZnSe and other dielectric materials have been grown with high thickness uniformity using the new ultrahigh vacuum (UHV) molecular beam deposition (MBD) technique. Optical techniques have been employed to demonstrate that variations in thickness down to as little as + 0.15% over 90 mm diam can be achieved. © 1990, American Vacuum Society. All rights reserved.

引用

页码：3934 / 3937

页数：4

共 9 条

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