THE PROBLEM OF REACTIVE SPUTTERING AND COSPUTTERING OF ELEMENTAL TARGETS

被引：49

作者：

STEENBECK, K

STEINBEISS, E

UFERT, KD

机构：

来源：

THIN SOLID FILMS | 1982年 / 92卷 / 04期

关键词：

D O I：

10.1016/0040-6090(82)90162-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：371 / 380

页数：10

共 12 条

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[5]

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STEENBECK, K ;

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[7]

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[8] USE OF RING GAP PLASMATRON FOR HIGH-RATE SPUTTERING [J].

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[9]

SCHILLER S, 1981, VAKUUMTECHNIK, V30, P1

[10]

STEENBECK K, 1981, Patent No. 2288177

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