FABRICATION OF TL-BA-CA-CU-O FILMS BY ANNEALING RF-SPUTTERED BA-CA-CU-O FILMS IN THALLIUM OXIDE VAPORS

被引:13
作者
SHAH, SI
HERRON, N
FINCHER, CR
HOLSTEIN, WL
机构
[1] Central Research and Development Department, Experimental Station, E. I. du Pont de Nemours and Company, Wilmington, DE 19880-0356
关键词
D O I
10.1063/1.103316
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thin, superconducting Tl-Ba-Ca-Cu-O films were grown using a two-step fabrication process which involved the growth of Ba-Ca-Cu-O films by reactive magnetron sputtering followed by ex situ high-temperature crystallization and thallination under thallium oxide vapors. Films were thallinated with both Tl2O3 and Tl2Ba2CuO6 as the source for thallium oxide vapors. Highly oriented films were obtained with the c axis perpendicular to the surface of the film. Best films had a T c (R=0) of 104 K and a critical current density of 5×10 4 A/cm2 at 77 K.
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收藏
页码:782 / 784
页数:3
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