EFFECT OF PHOTOSTABILIZERS ON RATE OF PHOTODEGRADATION OF POLYMETHYLMETHACRYLATE

被引：18

作者：

SHLYAPIN.VY ^{[1
]}

GOLDENBE.VI ^{[1
]}

机构：

[1] ACAD SCI USSR, INST CHEM PHYS, VOROBEVSKOE SHOSSE 2B, MOSCOW, USSR

来源：

EUROPEAN POLYMER JOURNAL | 1974年 / 10卷 / 08期

关键词：

D O I：

10.1016/0014-3057(74)90179-7

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：679 / 684

页数：6

共 13 条

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[4] PHOTOLYTIC DEGRADATION OF POLY(METHYL METHACRYLATE) [J].

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ISAACS, LG ;

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[5]

FROLOVA MI, 1967, VYSOKOMOL SOEDIN, V3, P877

[6] PROTECTION AGAINST RADIATION DAMAGE IN POLYMETHYLMETHACRYLATE BY HIGH-ENERGY ELECTRONS AND BY ULTRAVIOLET LIGHT [J].

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EPSTEIN, LM .

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[7] SENSITIVITY OF MIXTURES OF SYNDIOTACTIC AND ISOTACTIC POLY(METHYL METHACRYLATE) TO CHAIN SCISSION INDUCED BY ULTRAVIOLET LIGHT [J].

GARDNER, DG ;

HENRY, GA .

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[8]

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[9]

Nagai H., 1963, J APPL POLYM SCI, V7, P1697, DOI DOI 10.1002/APP.1963.070070512

[10]

Pivovarov A. P., 1968, KHIM VYS ENERG, V2, P220

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