LASER-PHOTOLYSIS STUDY OF ARYL-SUBSTITUTED SILYL AND STANNYL ANIONS

被引：5

作者：

MOCHIDA, K ^{[1
]}

WAKASA, M ^{[1
]}

SAKAGUCHI, Y ^{[1
]}

HAYASHI, H ^{[1
]}

机构：

[1] INST PHYS & CHEM RES, WAKO, SAITAMA 35101, JAPAN

来源：

CHEMISTRY LETTERS | 1986年 / 05期

关键词：

D O I：

10.1246/cl.1986.773

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：773 / 776

页数：4

共 14 条

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