FABRICATION OF ULTRASMALL NB-ALOX-NB JOSEPHSON TUNNEL-JUNCTIONS

被引：26

作者：

MARTINIS, JM

ONO, RH

机构：

来源：

APPLIED PHYSICS LETTERS | 1990年 / 57卷 / 06期

关键词：

D O I：

10.1063/1.103618

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We describe a fabrication process to make Nb-AlOx-Nb edge junctions with areas as small as 0.0022 μm2 and with current densities from 10 to 24 000 A/cm2. The junction conductance was low for voltages below the superconducting energy gap which indicates good quality tunnel barriers. Coulomb gap measurements obtained when the junctions were in the normal state were used to find the junction capacitance. Junction capacitance as small as 0.18 fF has been measured.

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页码：629 / 631

页数：3

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