LOCAL-STRUCTURE OF A COPPER SURFACE CHLORINATED AT A LOW-TEMPERATURE

被引：14

作者：

ANDRYUSHECHKIN, BV

ELTSOV, KN

机构：

[1] General Physics Institute, Academy of the Sciences, the USSR, 117942 Moscow

来源：

SURFACE SCIENCE | 1992年 / 265卷 / 1-3期

关键词：

D O I：

10.1016/0039-6028(92)90482-L

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Using a chlorination reaction of copper, the possibility of the application of the electron energy loss fine structure (EELFS) technique for the determination of the local structure of the formed chloride film was shown. The intense extended fine structure above the Cl L2,3-edge detected in thin CuCl films permitted to obtain the nearest neighbors distance Cl-Cu which was equal to 2.32 +/- 0.03 angstrom. This value is in good agreement with the corresponding one for bulk CuCl.

引用

页码：L245 / L247

页数：3

共 15 条

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