PROPERTIES OF EPITAXIAL SILICON FILMS ON SPINEL BEFORE AND AFTER OXIDATION

被引:2
作者
GASSMANN, F [1 ]
AESCHLIMANN, R [1 ]
BANZIGER, U [1 ]
机构
[1] ETH, INST TECH PHYS, ZURICH 8049, SWITZERLAND
关键词
D O I
10.1016/0025-5408(72)90186-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:1493 / 1496
页数:4
相关论文
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