NONUNIFORMITY IN AMORPHOUS RIBBON DELAY-LINES AFTER STRESS AND CURRENT ANNEALING

被引:41
作者
HRISTOFOROU, E
REILLY, RE
机构
[1] Electronic and Electrical Engineering Department, King's College, University of London, London WC2R 2LS, Strand
关键词
D O I
10.1063/1.348157
中图分类号
O59 [应用物理学];
学科分类号
摘要
Experimental results concerning the reduction of the amplitude nonuniformity of a Metglas 2605SC magnetostrictive delay line (MDL) after stress relief and current annealing under stress are reported. Nonuniformity is defined here as the fluctuation of the peak voltage V0 received by a coil around the MDL at a fixed position versus the distance between the coil and the point of excitation by a pulsed magnetic field, under uniform conditions of bias field and geometry along the length of the MDL. Stress-relieved delay lines were subjected to stress and current annealing. The results show that the fluctuation function was improved for a stress-relieved MDL, subjected to 200 N/mm2 stress and 300 m amps dc longitudinal annealing current. It was also observed that the normalized relationship for V0 versus the exciting pulsed current is the same for any point of excitation under uniform conditions of dc bias field. This could be used to simplify a computational correction of the nonuniformity function.
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页码:5008 / 5010
页数:3
相关论文
共 8 条
[1]   NEW MECHANICAL-STRESS TRANSDUCERS BASED ON AMORPHOUS-ALLOYS [J].
HRISTOFOROU, E ;
REILLY, RE .
IEEE TRANSACTIONS ON MAGNETICS, 1990, 26 (05) :1563-1565
[2]  
MASUDA S, 1990, IEEE T MAGN, V26, P1801
[3]  
ROTHBART A, 1962, ELECTRONICS 0413, P55
[4]  
ROTHBART A, 1962, ELECTRONICS 0813, P43
[5]   DEPENDENCE OF MAGNETOSTRICTION ON INDUCED ANISOTROPY IN METALLIC GLASSES [J].
THOMAS, AP ;
GIBBS, MRJ ;
SQUIRE, PT .
IEEE TRANSACTIONS ON MAGNETICS, 1990, 26 (05) :1406-1408
[6]  
THOMPSON TB, 1956, IRE T PGUE, V4, P8
[7]  
VANDENBERG KG, 1982, J PHYS E SCI INSTRUM, V15, P325, DOI 10.1088/0022-3735/15/3/020
[8]  
Williams R., 1959, IEEE T ULTRASON ENG, V6, P16, DOI 10.1109/T-PGUE.1959.29250