ROOM-TEMPERATURE RECRYSTALLIZATION IN THICK BIAS-SPUTTERED COPPER DEPOSITS

[1] RECRYSTALLIZATION OF ZONE-REFINED ALUMINIUM [J]. ACTA METALLURGICA, 1959, 7 (02): : 136 - 137

[2] PREPARATION OF ALUMINIUM OF EXTREME PURITY BY THE ZONE FUSION PROCESS [J]. NATURE, 1954, 174 (4437) : 923 - 923

[3] DECKER BF, 1950, T AM I MIN MET ENG, V188, P887

[4] HOFFMAN RW, 1966, PHYS THIN FILMS, V3, P228

[5] INTRINSIC STRESS IN EVAPORATED METAL FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (08) : 823 - &

[6] MAISSEL LI, 1966, PHYS THIN FILMS, V3, P71

[7] MAISSEL LI, 1966, PHYS THIN FILMS, V3, P94

[8] MAISSEL LI, 1970, HDB THIN FILM TECHNO, P23

[9] THE ORIGIN OF STRESS IN METAL LAYERS CONDENSED FROM THE VAPOUR IN HIGH VACUUM [J]. PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1953, 66 (407): : 905 - 910

[10] VANBUEREN HG, 1960, IMPERFECTIONS CRYSTA, P455

[1] RECRYSTALLIZATION OF ZONE-REFINED ALUMINIUM [J]. ACTA METALLURGICA, 1959, 7 (02): : 136 - 137

[2] PREPARATION OF ALUMINIUM OF EXTREME PURITY BY THE ZONE FUSION PROCESS [J]. NATURE, 1954, 174 (4437) : 923 - 923

[3] DECKER BF, 1950, T AM I MIN MET ENG, V188, P887

[4] HOFFMAN RW, 1966, PHYS THIN FILMS, V3, P228

[5] INTRINSIC STRESS IN EVAPORATED METAL FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (08) : 823 - &

[6] MAISSEL LI, 1966, PHYS THIN FILMS, V3, P71

[7] MAISSEL LI, 1966, PHYS THIN FILMS, V3, P94

[8] MAISSEL LI, 1970, HDB THIN FILM TECHNO, P23

[9] THE ORIGIN OF STRESS IN METAL LAYERS CONDENSED FROM THE VAPOUR IN HIGH VACUUM [J]. PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1953, 66 (407): : 905 - 910

[10] VANBUEREN HG, 1960, IMPERFECTIONS CRYSTA, P455