EFFECTS OF ANNEALING IN HG VAPOR ON THE PROPERTIES OF RF-SPUTTERED THIN-FILMS OF (HG1-XCDX)TE

被引:2
作者
CORNELY, RH
SUCHOW, L
MULLIGAN, M
CHAN, TO
HAQ, R
MEHTA, C
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 18卷 / 02期
关键词
D O I
10.1116/1.570721
中图分类号
O59 [应用物理学];
学科分类号
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页码:190 / 194
页数:5
相关论文
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