PHOTOSENSITIVITY IN GE-DOPED SILICA OPTICAL WAVE-GUIDES AND FIBERS WITH 193-NM LIGHT FROM AN ARF EXCIMER-LASER

被引：78

作者：

ALBERT, J ^{[1
]}

MALO, B ^{[1
]}

BILODEAU, F ^{[1
]}

JOHNSON, DC ^{[1
]}

HILL, KO ^{[1
]}

HIBINO, Y ^{[1
]}

KAWACHI, M ^{[1
]}

机构：

[1] NIPPON TELEGRAPH & TEL PUBL CORP, TOKAI, IBARAKI 31911, JAPAN

来源：

OPTICS LETTERS | 1994年 / 19卷 / 06期

关键词：

D O I：

10.1364/ol.19.000387

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Photosensitivity in optical fibers and waveguides has been associated with the bleaching of an absorption band located near 5.0 eV (or 242 ran). We present new results for Bragg grating formation and UV bleaching experiments carried out using 193-nm light from an ArF excimer laser instead of the usual laser sources operating new 242 or 248 nm.

引用

页码：387 / 389

页数：3

共 15 条

[1] OBSERVATIONS OF CHANGES IN UV ABSORPTION-BANDS OF SINGLEMODE GERMANOSILICATE CORE OPTICAL FIBERS ON WRITING AND THERMALLY ERASING REFRACTIVE-INDEX GRATINGS
ATKINS, RM
MIZRAHI, V
[J]. ELECTRONICS LETTERS, 1992, 28 (18) : 1743 - 1744
[2] MECHANISMS OF ENHANCED UV PHOTOSENSITIVITY VIA HYDROGEN LOADING IN GERMANOSILICATE GLASSES
ATKINS, RM
LEMAIRE, PJ
ERDOGAN, T
MIZRAHI, V
[J]. ELECTRONICS LETTERS, 1993, 29 (14) : 1234 - 1235
[3] O-2 MOLECULES DISSOLVED IN SYNTHETIC SILICA GLASSES AND THEIR PHOTOCHEMICAL-REACTIONS INDUCED BY ARF EXCIMER LASER-RADIATION
AWAZU, K
KAWAZOE, H
[J]. JOURNAL OF APPLIED PHYSICS, 1990, 68 (07) : 3584 - 3591
[4] PHOTOSENSITIZATION OF OPTICAL-FIBER AND SILICA-ON-SILICON SILICA WAVE-GUIDES
BILODEAU, F
MALO, B
ALBERT, J
JOHNSON, DC
HILL, KO
HIBINO, Y
ABE, M
KAWACHI, M
[J]. OPTICS LETTERS, 1993, 18 (12) : 953 - 955
[5] PHOTOINDUCED REFRACTIVE-INDEX CHANGES IN GERMANOSILICATE FIBERS
HAND, DP
RUSSELL, PS
[J]. OPTICS LETTERS, 1990, 15 (02) : 102 - 104
[6] PHOTOSENSITIVITY IN OPTICAL FIBER WAVEGUIDES - APPLICATION TO REFLECTION FILTER FABRICATION
HILL, KO
FUJII, Y
JOHNSON, DC
KAWASAKI, BS
[J]. APPLIED PHYSICS LETTERS, 1978, 32 (10) : 647 - 649
[7] BRAGG GRATINGS FABRICATED IN MONOMODE PHOTOSENSITIVE OPTICAL FIBER BY UV EXPOSURE THROUGH A PHASE MASK
HILL, KO
MALO, B
BILODEAU, F
JOHNSON, DC
ALBERT, J
[J]. APPLIED PHYSICS LETTERS, 1993, 62 (10) : 1035 - 1037
[8] NATURE AND ORIGIN OF THE 5-EV BAND IN SIO2-GEO2 GLASSES
HOSONO, H
ABE, Y
KINSER, DL
WEEKS, RA
MUTA, K
KAWAZOE, H
[J]. PHYSICAL REVIEW B, 1992, 46 (18): : 11445 - 11451
[9] SILICA WAVE-GUIDES ON SILICON AND THEIR APPLICATION TO INTEGRATED-OPTIC COMPONENTS
KAWACHI, M
[J]. OPTICAL AND QUANTUM ELECTRONICS, 1990, 22 (05) : 391 - 416
[10] RELIABILITY OF OPTICAL FIBERS EXPOSED TO HYDROGEN - PREDICTION OF LONG-TERM LOSS INCREASES
LEMAIRE, PJ
[J]. OPTICAL ENGINEERING, 1991, 30 (06) : 780 - 789

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