PHOTOCHEMICALLY-REMOVABLE SILYL PROTECTING GROUPS

被引：28

作者：

PIRRUNG, MC

LEE, YR

机构：

[1] Department of Chemistry, P. M. Gross Chemical Laboratory, Duke University, Durham

来源：

JOURNAL OF ORGANIC CHEMISTRY | 1993年 / 58卷 / 25期

关键词：

D O I：

10.1021/jo00077a010

中图分类号：

O62 [有机化学];

学科分类号：

070303 ; 081704 ;

摘要：

(Hydroxystyryl)dimethylsilyl (HSDMS) and (hydroxystyryl)diisopropylsilyl (HSDIS) reagents have been developed that readily protect primary and secondary alcohols and can be removed on irradiation with short wavelength light in polar solvent.

引用

页码：6961 / 6963

页数：3

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