MECHANISTIC STUDY ON PHOTOCURING OF A METHACRYLATES COPOLYMER BY BENZOPHENONES

被引：10

作者：

ITO, Y ^{[1
]}

AOKI, Y ^{[1
]}

MATSUURA, T ^{[1
]}

KAWATSUKI, N ^{[1
]}

UETSUKI, M ^{[1
]}

机构：

[1] KURARAY CO,CENT RES LABS,KURASHIKI 710,JAPAN

来源：

JOURNAL OF APPLIED POLYMER SCIENCE | 1991年 / 42卷 / 02期

关键词：

D O I：

10.1002/app.1991.070420213

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

The types of photochemical reactions that will occur in the photosensitive resin for optical devices, poly (methyl methacrylate-co-crotyl methacrylate) (PMMA-CMA) doped with meta-benzoylbenzophenone (BBP) were investigated. Oxetane formation, hydrogen abstraction followed by radical coupling, and pinacol formation were found to occur. The quantum yield for disappearance of benzopheonone (BP) in the PMMA-CMA film was estimated at 0.68. The pendant crotyl group seems to be a major photoreaction site.

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页码：409 / 415

页数：7

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