DETERMINATION OF THE THRESHOLD-ENERGY SURFACE FOR COPPER USING INSITU ELECTRICAL-RESISTIVITY MEASUREMENTS IN THE HIGH-VOLTAGE ELECTRON-MICROSCOPE

被引：27

作者：

KING, WE ^{[1
]}

MERKLE, KL ^{[1
]}

MESHII, M ^{[1
]}

机构：

[1] ARGONNE NATL LAB,DIV MAT SCI,ARGONNE,IL 60439

来源：

PHYSICAL REVIEW B | 1981年 / 23卷 / 12期

关键词：

D O I：

10.1103/PhysRevB.23.6319

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：6319 / 6334

页数：16

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