CHEMICALLY VAPOUR-DEPOSITED HARD COATINGS - APPLICATIONS AND SELECTION GUIDELINES

被引:26
作者
LUX, B
HAUBNER, R
WOHLRAB, C
机构
关键词
D O I
10.1016/0257-8972(89)90089-3
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:267 / 280
页数:14
相关论文
共 73 条
  • [1] ALTENA H, 1983, 4TH P EUR C CVD EIND, P428
  • [2] THE PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TIC, TIN AND TICXN1-X
    ARCHER, NJ
    [J]. THIN SOLID FILMS, 1981, 80 (1-3) : 221 - 225
  • [3] BAUERLE D, 1985, 5TH P EUR CVD C UPPS, P60
  • [4] BECKER G, 1941, STAHL EISEN, V61, P289
  • [5] BERGMANN E, 1987, COMMUNICATION
  • [6] BERGMANN E, 1985, 8TH P ICVM LINZ, P370
  • [7] BERMANN E, 1987, J VAC SCI TECHNOL A, V5, P70
  • [8] BONETTI R, 1983, 4TH EURO CVD C EINDH, P510
  • [9] BONETTI RS, 1983, 3RD P INT C HEAT TRE, P328
  • [10] BONETTILANG M, BERNABERNEX AG CH460