SCANNING-TUNNELING-MICROSCOPY STUDY ON YBA2CU3O7-X FILMS WITH GROWTH STOP BY OBSERVING REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION OSCILLATIONS

被引:5
作者
HIRATA, K [1 ]
BAUDENBACHER, F [1 ]
LANG, HP [1 ]
GUNTHERODT, HJ [1 ]
KINDER, H [1 ]
机构
[1] UNIV BASEL,INST PHYS,CH-4056 BASEL,SWITZERLAND
关键词
D O I
10.1016/0925-8388(93)90697-L
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The growth of YBa2Cu3O7-x thin films was stopped on a maximum or a minimum of an intensity oscillation in reflection high- energy electron diffraction(RHEED). The resulting film surfaces were observed by scanning tunneling microscopy. Films stopped on a maximum have smoother surfaces, closer to the completion of a monolayer of unit cells, than those on a minimum. The width of monolayer terraces was almost the same as that of the substrates determined from the misorientation. On the terraces, islands of one unit cell height were observed, so that the diffusion length of YBa2Cu3O7-x must be shorter than the terrace size.
引用
收藏
页码:105 / 108
页数:4
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