The fine structure of H-alpha and D-alpha under varying discharge conditions

被引：45

作者：

Williams, RC ^{[1
]}

机构：

[1] Cornell Univ, Ithaca, NY USA

来源：

PHYSICAL REVIEW | 1938年 / 54卷 / 08期

关键词：

D O I：

10.1103/PhysRev.54.558

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：558 / 567

页数：10

共 15 条

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