MICROSTRUCTURAL CHARACTERIZATION OF FERROELECTRIC THIN-FILMS IN TRANSVERSE SECTION

A technique has been developed for the TEM examination of ferroelectric thin films in transverse section. Some preliminary results are reported for three different thin-film/substrate systems. The microstructures of thin films of lead scandium tantalate deposited onto sapphire and MgO, and lead titanate deposited onto AlN, have been examined, with particular attention being paid to the quality of the thin-film/substrate interfaces and to the changes in the nature of the microstructures of the thin films as a function of distance from their substrates. It is demonstrated that the technique successfully produces adequate electron transparent regions for the characterization of the thin-film/substrate interface of all the samples examined and that it is possible to prepare transverse sections of ferroelectric thin films routinely.