A NOVEL SILICON ACCELEROMETER WITH A SURROUNDING MASS STRUCTURE

被引:17
作者
YAMADA, K
HIGUCHI, K
TANIGAWA, H
机构
[1] Microelectronics Research Laboratories, NEC Corporation, Sagamihara, Kanagawa, 229, Shimokuzawa
关键词
Cantilever Beams - Seismic Mass - Silicon Micromachining Technology;
D O I
10.1016/0924-4247(90)85061-8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new accelerometer with a surrounding mass structure is proposed to achieve the extreme reduction in sensor die size. The sensor has a very high sensitivity due to a high seismic mass area ratio compared to a conventional accelerometer. This structure provides a heavy seismic mass without a plating which lowers compatibility with standard IC processes. This sensor has one support at a gravitation center for the sensor die, four cantilever beams spread symmetrically around the support and a surrounding seismic mass which is linked to the cantilever beams. The fabricated sensor has a rhombic structure with a 5 mm × 3.5 mm diagonal size. The 0.02 mV/g/V sensitivity is obtained with a beam size of 500 × 100 × 10 μm. This paper describes the structure and the fabrication process as well as the characteristics for the sensor. © 1990.
引用
收藏
页码:308 / 311
页数:4
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