THE CRYSTALLINITY OF ZNS THIN-FILMS PREPARED BY MOCVD

被引：6

作者：

LI, JW ^{[1
]}

SU, YK ^{[1
]}

YOKOYAMA, M ^{[1
]}

TAKAHASHI, M ^{[1
]}

NAKATA, T ^{[1
]}

HASHIMOTO, Y ^{[1
]}

机构：

[1] DAI NIPPON PRINTING CO LTD,MICRO PROD RES LAB,KAMIFUKUOKA,SAITAMA 356,JAPAN

来源：

APPLIED SURFACE SCIENCE | 1993年 / 65-6卷

关键词：

D O I：

10.1016/0169-4332(93)90697-A

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

In this study, ZnS thin films prepared by low pressure metalorganic chemical vapor deposition (MOCVD) have been deposited on HOYA NA-40 glass coated with indium tin oxide (ITO). The effects of the [H2S]/[DMZn] molar ratio on the crystallinity and surface morphology of epitaxial ZnS thin films have been studied. The surface morphology, which has been evaluated by scanning electron microscope (SEM), shows a relatively flat and uniform surface. The crystallinity has also been measured. We have also etched the ZnS thin film by reactive ion etching (RIE) in a mixed gas Of Cl2, BCl3 and Ar.

引用

页码：433 / 436

页数：4

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