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AMORPHOUS CHROMIUM-SILICON - MATERIAL FOR KILO-OHM SHEET RESISTANCES
被引:24
作者
:
HIEBER, K
论文数:
0
引用数:
0
h-index:
0
机构:
Forschungslaboratorien der Siemens AG, 8000 München 83
HIEBER, K
机构
:
[1]
Forschungslaboratorien der Siemens AG, 8000 München 83
来源
:
THIN SOLID FILMS
|
1979年
/ 57卷
/ 02期
关键词
:
D O I
:
10.1016/0040-6090(79)90178-0
中图分类号
:
T [工业技术];
学科分类号
:
08 ;
摘要
:
On investigating the relationship between the composition, structure and electrical properties of sputtered Cr-Si films we found a highly stable material (mole fraction of silicon, 57 ± 7%) with a resistivity of 580 ± 50 μΩ cm and a temperature coefficient of resistivity (TCR) of -80 to -130 ppm K-1. Using the same target but with a substrate temperature during deposition of about 400°C and with an oxygen partial pressure of about 10-1 N m-2, it was possible to produce films with a resistivity of up to 11 000 μΩ cm and with a TCR of less than -300 ppm K-1. Electron diffraction patterns of the films showed an amorphous structure. To confirm the stability and reproducibility of the material several hundred films (thickness, 28 nm) were produced. The change ΔR/R in the resistance of these films (without preheating in air and without using a protective layer) after annealing in air at 150°C for 250 h was less than 1%. © 1979.
引用
收藏
页码:353 / 357
页数:5
相关论文
共 2 条
[1]
HEID K, 1973, SOLID STATE TECHNOL, V16, P56
[2]
STRUCTURAL AND ELECTRICAL-PROPERTIES OF CRSI2 THIN-FILM RESISTORS
[J].
HIEBER, K
论文数:
0
引用数:
0
h-index:
0
机构:
SIEMENS AG,FORSCH LAB,D-8000 MUNICH 80,FED REP GER
SIEMENS AG,FORSCH LAB,D-8000 MUNICH 80,FED REP GER
HIEBER, K
;
DITTMANN, R
论文数:
0
引用数:
0
h-index:
0
机构:
SIEMENS AG,FORSCH LAB,D-8000 MUNICH 80,FED REP GER
SIEMENS AG,FORSCH LAB,D-8000 MUNICH 80,FED REP GER
DITTMANN, R
.
THIN SOLID FILMS,
1976,
36
(02)
:357
-360
←
1
→
共 2 条
[1]
HEID K, 1973, SOLID STATE TECHNOL, V16, P56
[2]
STRUCTURAL AND ELECTRICAL-PROPERTIES OF CRSI2 THIN-FILM RESISTORS
[J].
HIEBER, K
论文数:
0
引用数:
0
h-index:
0
机构:
SIEMENS AG,FORSCH LAB,D-8000 MUNICH 80,FED REP GER
SIEMENS AG,FORSCH LAB,D-8000 MUNICH 80,FED REP GER
HIEBER, K
;
DITTMANN, R
论文数:
0
引用数:
0
h-index:
0
机构:
SIEMENS AG,FORSCH LAB,D-8000 MUNICH 80,FED REP GER
SIEMENS AG,FORSCH LAB,D-8000 MUNICH 80,FED REP GER
DITTMANN, R
.
THIN SOLID FILMS,
1976,
36
(02)
:357
-360
←
1
→