HELIUM DIFFRACTION FROM OVERLAYERS PHYSISORBED ON A SELF-ASSEMBLED ORGANIC MONOLAYER

被引：41

作者：

CHIDSEY, CED

LIU, GY

SCOLES, G

WANG, J

机构：

[1] PRINCETON UNIV,DEPT CHEM,PRINCETON,NJ 08544

[2] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

LANGMUIR | 1990年 / 6卷 / 12期

关键词：

D O I：

10.1021/la00102a017

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Low-energy helium diffraction has been used to study the structure of Xe, Kr, H20, CH3OH, and n-C6H14 physisorbed on a monolayer of CH3(CH2)21SH self-assembled on a Au(111) film supported by mica. Xe and Kr have a close-packed structure with lattice constants 4.45 +/- 0.05 and 4.07 +/- 0.03 angstrom, respectively, which are slightly larger than the interatomic distances in the corresponding bulk phases. No surface order is detected with H20 and CH3OH overlayers, which is consistent with the fact that these adsorbates do not wet this organic surface. Although n-C6H14 is known to wet the surface of CH3(CH2)21SH/Au(111)/mica, it may not form an ordered overlayer, as we were not yet able to detect an diffraction in this case.

引用

页码：1804 / 1806

页数：3

共 27 条

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