INFLUENCE OF SURFACE-ROUGHNESS UPON DETERMINATION OF THICKNESS OF THIN EVAPORATED FILMS

被引：5

作者：

DAHL, H

FRAGSTEI.CV

SCHULZ, G

机构：

来源：

ZEITSCHRIFT FUR PHYSIK | 1968年 / 217卷 / 05期

关键词：

D O I：

10.1007/BF01394181

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The independent determination of the thicknesses of thin vacuum-deposited metal-films by the method of Tolansky and a X-ray-fluorescence-analytical method showed, that the Tolansky-method generally yields thicknesses, systematically too large by about 60-100 Å. The reason for this discrepancy may be, that the silverfilm, deposited on the testlayer, only incompletely adjusts itself to the roughness of the testlayer-surface. © 1969 Springer-Verlag.

引用

页码：409 / &