ROLE OF CERIUM ORTHOSILICATE IN THE DENSIFICATION OF SI3N4

被引:32
作者
MAH, TI [1 ]
MAZDIYASNI, KS [1 ]
RUH, R [1 ]
机构
[1] USAF,MAT LAB,WRIGHT PATTERSON AFB,OH 45433
关键词
D O I
10.1111/j.1151-2916.1979.tb18795.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The existence of compounds between Si3N4‐CeO2 and Si3N4‐Ce2O3 was investigated for firing temperatures of 1600° to 1700°C. The two new monoclinic compounds found were Ce2O3·2Si3N4 with lattice parameters a= 16.288, b= 4.848, and c=7.853 Å and β=91.54° and Ce4Si2O7N2 with lattice parameters a= 10.360, b= 10.865, and c=3.974 Å and β=90.33°. Cerium orthosilicate (Ce4.67(SiO4)3O) is present during firing as a glassy intermediate phase which promotes sintering and densification and then reacts with silicon nitride to form cerium silicon oxynitrde (CeSiO2N). Copyright © 1979, Wiley Blackwell. All rights reserved
引用
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页码:12 / 16
页数:5
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