LOW-ENERGY DEPTH DISTRIBUTIONS IN PT,AL, AND KCL AS OBTAINED BY SPUTTERING

被引：13

作者：

KELLY, R

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1968年 / 39卷 / 11期

关键词：

D O I：

10.1063/1.1655955

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：5298 / &

相关论文

共 30 条

[1] RANGE STUDIES USING A NEW CHEMICAL FILM TECHNIQUE
ANDERSEN, T
SORENSEN, G
[J]. CANADIAN JOURNAL OF PHYSICS, 1968, 46 (06) : 483 - &
[2] OXIDATION OF EVAPORATED MAGNESIUM FILMS
COHEN, MS
[J]. ACTA METALLURGICA, 1960, 8 (06): : 356 - 361
[3] RANGE OF ENERGETIC XE125 IONS IN MONOCRYSTALLINE SILICON
DAVIES, JA
BROWN, F
BALL, GC
DOMEIJ, B
[J]. CANADIAN JOURNAL OF PHYSICS, 1964, 42 (06) : 1070 - &
[4] DAVIES JA, 1963, ARK FYS, V24, P377
[5] A RADIOCHEMICAL TECHNIQUE FOR STUDYING RANGE-ENERGY RELATIONSHIPS FOR HEAVY IONS OF KEV ENERGIES IN ALUMINUM
DAVIES, JA
FRIESEN, J
MCINTYRE, JD
[J]. CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE, 1960, 38 (09): : 1526 - 1534
[6] RANGES OF HEAVY IONS IN AMORPHOUS OXIDES
DOMEIJ, B
BROWN, F
DAVIES, JA
MCCARGO, M
[J]. CANADIAN JOURNAL OF PHYSICS, 1964, 42 (08) : 1624 - &
[7] DOMEIJ B, 1966, ARK FYS, V32, P179
[8] ADSORPTION OF OXYGEN ON SILICON
EISINGER, J
LAW, JT
[J]. JOURNAL OF CHEMICAL PHYSICS, 1959, 30 (02) : 410 - 412
[9] MECHANISM OF ION BOMBARDMENT INDUCED RELEASE OF GAS FROM TUNGSTEN
ERENTS, K
CARTER, G
[J]. VACUUM, 1967, 17 (02) : 97 - &
[10] INERT GAS SPUTTERING FROM PYREX GLASS
GRANT, WA
CARTER, G
[J]. PHYSICS LETTERS, 1966, 23 (07): : 456 - &