MORPHOLOGY OF HIGH-RATE PHYSICAL-VAPOR-DEPOSITED TI AND CO

被引:2
作者
MARCUS, HL
JEAN, D
TURK, CD
机构
[1] Texas Instruments, Inc., Metallurgical Materials Division, Metallurgy Branch, Attleboro
来源
JOURNAL OF THE LESS-COMMON METALS | 1968年 / 15卷 / 04期
关键词
D O I
10.1016/0022-5088(68)90104-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Electron-beam high-rate evaporation of hexagonal close packed metals yields highly-orientated vapor-deposited foils. The morphology of both titanium and cobalt are shown to be dependent on the deposition parameters. A change in deposition rate was found significantly to affect the structure of titanium foils. All temperatures and rates gave basal planes parallel to the substrate for the titanium foils. A change in substrate temperatures from 500 °C to 8oo °C for the cobalt affected both structure and texturing. At 5oo °C, the cobalt was oriented so that the basal plane of the foil was predominantly parallel to the substrate but was changed to about 40 degrees from the substrate at 8oo °C. © 1968.
引用
收藏
页码:385 / &
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