NANOSCALE THICKNESS CHANGES OF NICKEL-HYDROXIDE FILMS DURING ELECTROCHEMICAL OXIDATION-REDUCTION MONITORED BY IN-SITU ATOMIC-FORCE MICROSCOPY

被引：39

作者：

HARING, P

KOTZ, R

机构：

[1] Electrochemistry Section, Paul Scherrer Institut

来源：

JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 1995年 / 385卷 / 02期

关键词：

FILM THICKNESS; NICKEL HYDROXIDE FILMS; OXIDATION; REDUCTION; ATOMIC FORCE MICROSCOPY;

D O I：

10.1016/0022-0728(94)03869-5

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

[No abstract available]

引用

页码：273 / 277

页数：5

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