STUDIES OF DIVACANCY IN SI USING POSITRON LIFETIME MEASUREMENT

被引:12
作者
KAWASUSO, A
HASEGAWA, M
SUEZAWA, M
YAMAGUCHI, S
SUMINO, K
机构
[1] Institute for Material Research, Tohoku University, Sendai
来源
HYPERFINE INTERACTIONS | 1994年 / 84卷 / 1-4期
关键词
D O I
10.1007/BF02060688
中图分类号
O64 [物理化学(理论化学)、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号
070203 ; 070304 ; 081704 ; 1406 ;
摘要
The charge state dependence of positron lifetime and trapping at divacancy (V2) in Si doped with phosphorus or boron has been studied after 15 MeV electron irradiation up to a fluence of 8.0 x 10(17) e/cm2. The positron trapping cross sections for V2-, V2- and V-2(0)at 300 K were about 6 x 10(-14), 3 x 10(-14) and 0.1-3 x 10(-14) cm2, respectively. For V2+, however, no positron trapping was observed. The marked difference in the cross sections comes from Coulomb interaction between the positron and the charged divacancy. The trapping rates for V-2(0) and V-2(2-) have been found to increase wi th decreasing temperature in the temperature range of 10-300 K. These results are well interpreted by a two-stage trapping model having shallow levels with energy of 9 meV (V-2(0)) and 21 meV (V-2(2-)). The appearance of a shallow level for V-2(0) can not be explained by a conventional ''Rydberg state'' model. The lifetime (290-300 ps) in V-2(0) is nearly constant in the temperature range from 10 to 300 K, while that in V-2(2-) increases from 260 ps at 10 K to 320 ps at 300 K. The lifetime (260 ps) in V-2(2-) is shorter than that in V-2(0) at low temperature. which is due to the excess electron density in V-2(2-). At high temperature, however, the longer lifetime of V-2(2-) than that of V-2(0) is attributed to lattice relaxation around V-2(2-).
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页码:397 / 406
页数:10
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