COMPUTER-SIMULATION OF LOW-ENERGY SPUTTERING IN THE BINARY COLLISION APPROXIMATION

被引:84
作者
HOU, M [1 ]
ROBINSON, MT [1 ]
机构
[1] OAK RIDGE NATL LAB,OAK RIDGE,TN 37830
来源
APPLIED PHYSICS | 1979年 / 18卷 / 04期
关键词
79.20;
D O I
10.1007/BF00899692
中图分类号
O59 [应用物理学];
学科分类号
摘要
The sputtering of amorphous Cu targets by low-energy atoms has been investigated in the binary collision approximation using the computer program MARLOWE. Particular attention was given to the influence of the surface binding model on the results. Calculations were made of the dependence of the sputtering yield on the incident particle direction, energy, and mass. Angular-, energy-, and yield-distributions of the ejected atoms were evaluated. Comparisons with experimental results on polycrystalline targets show that the planar surface binding model is to be preferred over the isotropic surface binding model, especially with regard to the angular- and energy-distributions. Calculated yields are in reasonable agreement with experiment at energies below about 1 keV, but deviate at higher energies, apparently because of crystal correlation effects that are neglected in the amorphous model. © 1978 Springer-Verlag.
引用
收藏
页码:381 / 389
页数:9
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