ANTIPARALLEL AND PERPENDICULAR MAGNETIZATION ALIGNMENT FOR CO/RU MULTILAYERS

被引:9
作者
VANKESTEREN, HW [1 ]
DENBROEDER, FJA [1 ]
BLOEMEN, PJH [1 ]
VANALPHEN, EAM [1 ]
DEJONGE, WJM [1 ]
机构
[1] EINDHOVEN UNIV TECHNOL,DEPT PHYS,5600 MB EINDHOVEN,NETHERLANDS
关键词
D O I
10.1016/0304-8853(91)90256-A
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Several Co/Ru multilayers were grown in which the magnetization directions of consecutive Co layers were aligned antiparallel and along the film normal. The magnetization curves for these multilayers agree with the curves obtained by minimizing the total energy including anisotropy and interlayer coupling. These multilayers were part of a series with Co thicknesses of 11 and 22 angstrom and Ru thicknesses varying between 5 and 20 angstrom. Torque and magnetization measurements showed that the multilayers with 11 angstrom Co had a perpendicular easy axis while for the 22 angstrom Co series an in-plane preferential orientation was observed. A strong antiferromagnetic interlayer coupling was obtained for Ru thicknesses of about 8 angstrom.
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页码:L9 / L14
页数:6
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