A STUDY OF NOVEL HEAT-RESISTANT POLYMERS - PREPARATION OF PHOTOSENSITIVE FLUORINATED POLYBENZOXAZOLE PRECURSORS AND PHYSICAL-PROPERTIES OF POLYBENZOXAZOLES DERIVED FROM THE PRECURSORS

被引：30

作者：

YAMAOKA, T ^{[1
]}

NAKAJIMA, N ^{[1
]}

KOSEKI, K ^{[1
]}

MARUYAMA, Y ^{[1
]}

机构：

[1] CENT GLASS CO LTD,TOKYO RES CTR,KAWAGOE,SAITAMA 356,JAPAN

来源：

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY | 1990年 / 28卷 / 09期

关键词：

Plastics Films--Electric Properties - Plastics--Physical Properties - Solvents;

D O I：

10.1002/pola.1990.080280924

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

A series of novel photosensitive polybenzoxazole precursors were prepared from polycondensation of 2,2‐bis(3,3′‐amino‐4,4′‐hydroxyphenyl)hexafluoropropane with photosensitive dicarboxylic acid chlorides such as p‐phenylenediacryloyl chloride and benzophenone‐4,4′‐dicarboxylic chloride. The precursors are soluble in common organic solvents owing to the presence of perfluoromethyl groups in the chain structure, and insolubilized in the solvents on irradiation with the light. Polybenzoxazole patterns with high resolution as well as high aspect ratio were reproduced by baking the precursor patterns at 300°C. The pattern shrinkage on the conversion to polybenzoxazole was slight. The polybenzoxazole films offered good heat‐resistance up to 400°C in addition to good electrical properties. Copyright © 1990 John Wiley & Sons, Inc.

引用

页码：2517 / 2532

页数：16

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