GAS-PHASE ETCHING OF SILICON WITH CHLORINE

被引：18

作者：

DISMUKES, JP

ULMER, R

机构：

来源：

关键词：

D O I：

10.1149/1.2408126

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：634 / &

共 15 条

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[3]

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[6]

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[7]

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[8]

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LANG GA, 1963, RCA REV, V24, P488

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