GA SELF-DIFFUSION IN GAAS

被引:6
作者
COHEN, RM
机构
[1] Dept. of Materials Science and Engineering, University of Utah, Salt Lake City, 84112, UT
关键词
GAAS; SELF-DIFFUSION; GA DIFFUSIVITY;
D O I
10.1007/BF02657822
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Evidence is summarized which indicates that the self-diffusion of Ga in GaAs may proceed by either the vacancy or interstitialcy mechanisms. It is possible to switch between these mechanisms with a variation of either the Fermi level or As pressure. Self-diffusion appears to be associated with Ga vacancies with charge of -3 in n-type GaAs, and Ga interstitials with charge of +2 in p-type GaAs. For intrinsic GaAs, the commonly observed V-shape in the Ga diffusivity vs As pressure plot is found to be consistent with these two diffusion mechanisms. Simple calculations can be used to predict the near-equilibrium Ga diffusivity from a single intrinsic Ga diffusion coefficient, when defined at appropriate standard conditions. A new model is presented to link the roll-over in Ga diffusivity and electron concentration at high donor concentrations.
引用
收藏
页码:425 / 430
页数:6
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