PREPARATION AND PROPERTIES OF SPUTTERED HAFNIUM AND ANODIC HFO2 FILMS

[1] AXELROD NN, 1966, J ELECTROCHEM SOC, V113, pC52

[2] AXELROD NN, 1966, ELECTROCHEM SOC M, V3, P6

[3] GERSTENBERG D, 1967, 14 NAT VAC S AM VAC, P9

[4] GOLDSTEIN RM, 1967, P ELEC COMP C, P312

[5] HUBER F, 1965, 3 P INT VAC C STUTTG

[6] HUBER F, 1967, RCA ENGINEER, V13, P57

[7] HUBER F, 1966, P IEEE COMPONENTS C, P326

[8] HUBER F, 1967, P ELECTRON COMPONENT, P66

[9] KITTEL C, 1966, INTRO SOLID STATE PH, P218

[10] DETERMINATION OF DENSITY AND DIELECTRIC CONSTANT OF THIN TA2O5 FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (09) : 896 - &

[1] AXELROD NN, 1966, J ELECTROCHEM SOC, V113, pC52

[2] AXELROD NN, 1966, ELECTROCHEM SOC M, V3, P6

[3] GERSTENBERG D, 1967, 14 NAT VAC S AM VAC, P9

[4] GOLDSTEIN RM, 1967, P ELEC COMP C, P312

[5] HUBER F, 1965, 3 P INT VAC C STUTTG

[6] HUBER F, 1967, RCA ENGINEER, V13, P57

[7] HUBER F, 1966, P IEEE COMPONENTS C, P326

[8] HUBER F, 1967, P ELECTRON COMPONENT, P66

[9] KITTEL C, 1966, INTRO SOLID STATE PH, P218

[10] DETERMINATION OF DENSITY AND DIELECTRIC CONSTANT OF THIN TA2O5 FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (09) : 896 - &