PIEZOBIREFRINGENCE ABOVE THE FUNDAMENTAL EDGE IN SI

被引:35
作者
CHANDRASEKHAR, M
GRIMSDITCH, MH
CARDONA, M
机构
[1] Max-Planck-Institut für Festkörperforschung
来源
PHYSICAL REVIEW B | 1978年 / 18卷 / 08期
关键词
D O I
10.1103/PhysRevB.18.4301
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report measurements of stress-induced birefringence in silicon in a spectral region (1.65 to 3.4 eV) where the material is opaque. A new technique that employs Raman scattering is used to extend the range of previous measurements performed in the transparent region below 1.2 eV. Theoretical fits to the data are made by considering the contributions to piezobirefringence due to the E1, E1+Δ1, and E2 transitions under uniaxial stresses along the [001] and [111] directions. © 1978 The American Physical Society.
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页码:4301 / 4311
页数:11
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