HIGH-RATE REACTIVE SPUTTERING PROCESS-CONTROL

被引：75

作者：

SPROUL, WD ^{[1
]}

机构：

[1] BORG WARNER RES CTR,DES PLAINES,IL 60018

来源：

SURFACE & COATINGS TECHNOLOGY | 1987年 / 33卷 / 1-4期

关键词：

D O I：

10.1016/0257-8972(87)90178-2

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：73 / 81

页数：9

共 19 条

[1] PREPARATION OF TITANIUM NITRIDE BY A PULSED DC MAGNETRON REACTIVE DEPOSITION TECHNIQUE USING THE MOVING MODE OF DEPOSITION [J].

ARONSON, AJ ;

CHEN, D ;

CLASS, WH .

THIN SOLID FILMS, 1980, 72 (03) :535-540

[2] QUANTITATIVE AUGER-ELECTRON ANALYSIS OF TITANIUM NITRIDES [J].

DAWSON, PT ;

TZATZOV, KK .

SURFACE SCIENCE, 1985, 149 (01) :105-118

[3] PRACTICAL SURFACE-ANALYSIS - STATE-OF-THE-ART AND RECENT DEVELOPMENTS IN AES, XPS, ISS AND SIMS [J].

HOFMANN, S .

SURFACE AND INTERFACE ANALYSIS, 1986, 9 (1-6) :3-20

[4] HYSTERESIS EFFECT IN REACTIVE SPUTTERING - A PROBLEM OF SYSTEM STABILITY [J].

KADLEC, S ;

MUSIL, J ;

VYSKOCIL, H .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1986, 19 (09) :L187-L190

[5]

MUENZ WD, 1985, SEP NITR CARB COAT C

[6]

MUENZ WD, IN PRESS VACUUM

[7] REACTIVE SPUTTERING CHARACTERISTICS OF SILICON IN AN AR-N2 MIXTURE [J].

OKAMOTO, A ;

SERIKAWA, T .

THIN SOLID FILMS, 1986, 137 (01) :143-151

[8] THE COLOR OF TIN AND HFN - AGING EFFECTS [J].

PERRY, AJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2670-2673

[9]

PERRY AJ, IN PRESS VACUUM

[10]

PERRY AJ, 1987, MAR P INT C MET COAT

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