CHARACTERISTICS OF ADHESION BETWEEN PHOTORESIST AND INORGANIC SUBSTRATE

被引:26
作者
NAGATA, H
KAWAI, A
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 10期
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D O I
10.1143/JJAP.28.2137
中图分类号
O59 [应用物理学];
学科分类号
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页码:2137 / 2141
页数:5
相关论文
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