SELF-SUSTAINED SELF-SPUTTERING - A POSSIBLE MECHANISM FOR THE SUPERDENSE GLOW PHASE OF A PSEUDOSPARK

被引：51

作者：

ANDERS, A

ANDERS, S

GUNDERSEN, MA

MARTSINOVSKII, AM

机构：

[1] UNIV SO CALIF,DEPT PHYS,LOS ANGELES,CA 90089

[2] ACAD SCI ST PETERSBURG,AF IOFFE PHYSICOTECH INST,ST PETERSBURG 194021,RUSSIA

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 1995年 / 23卷 / 03期

关键词：

D O I：

10.1109/27.402313

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Self-sustained self-sputtering occurring during high current pseudospark operation (approximate to 10(4) A/cm(2), I>10(3) A) is shown to be a possible mechanism for the superdense glow. The mean-free-path for ionization of cathode material sputtered in the low-current hollow-cathode phase can be shorter than the cathode-anode gap distance, and ionized atoms can return to the cathode surface, self-sputtering with a yield greater than one. The self-sputtered cathode atoms become ionized in the beam of electrons accelerated in the cathode sheath. A large fraction of the discharge current at the cathode surface can be carried uniformly over the surface by ions, and a very high electron emission density is not required to maintain the high current.

引用

页码：275 / 282

页数：8

共 40 条

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