STUDY OF SPUTTERING EFFECTS IN OXIDES AND METAL-ADSORBED-GAS SYSTEMS USING COMBINED ANALYTICAL TECHNIQUES

被引：31

作者：

TAGLAUER, E

HEILAND, W

MACDONALD, RJ

机构：

[1] Max-Planck-Institut für Plasmaphysik, Association EURATOM-IPP

来源：

SURFACE SCIENCE | 1979年 / 90卷 / 02期

关键词：

D O I：

10.1016/0039-6028(79)90366-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The sputtering of adsorbed O and CO on clean metal surfaces and of solid oxide surface layers has been investigated by various techniques. Aspects of the effect of adsorbed layers on particle excitation and of interatomic binding energy and kinetic energy transfer on the sputtering are studied. The results from various experiments can be explained within collisional models, no thermodynamic models being necessary. The role of recoil implantation is positively demonstrated. © 1979.

引用

页码：661 / 675

页数：15

共 37 条

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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 419 - 422

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