COPPER SULFIDE FILMS DEPOSITED BY CYLINDRICAL MAGNETRON REACTIVE SPUTTERING

被引:16
作者
JONATH, AD [1 ]
ANDERSON, WW [1 ]
THORNTON, JA [1 ]
CORNOG, DG [1 ]
机构
[1] TELIC CORP,SANTA MONICA,CA 90404
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 02期
关键词
D O I
10.1116/1.569907
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:200 / 203
页数:4
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