INSITU OXIDATION STUDIES ON (001) COPPER-NICKEL ALLOY THIN-FILMS

被引：9

作者：

HEINEMANN, K ^{[1
]}

RAO, DB ^{[1
]}

DOUGLASS, DL ^{[1
]}

机构：

[1] UNIV CALIF LOS ANGELES,DEPT APPL SCI & ENGN,LOS ANGELES,CA 90024

来源：

OXIDATION OF METALS | 1977年 / 11卷 / 06期

关键词：

D O I：

10.1007/BF00608015

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

页码：321 / 334

页数：14

共 18 条

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[2] BOUILLON F, 1962, 5TH P INT C EL MICR, pGG7
[3] COLES BR, 1956, J I MET, V84, P346
[4] GARMON LB, 1966, THESIS U VIRGINIA
[5] HANSEN M, 1958, CONSTITUTION BINARY, P601
[6] SELECTED-ZONE DARK-FIELD ELECTRON-MICROSCOPY
HEINEMANN, K
POPPA, H
[J]. APPLIED PHYSICS LETTERS, 1972, 20 (03) : 122 - +
[7] OXIDE NUCLEATION ON THIN-FILMS OF COPPER DURING INSITU OXIDATION IN AN ELECTRON-MICROSCOPE
HEINEMANN, K
RAO, DB
DOUGLASS, DL
[J]. OXIDATION OF METALS, 1975, 9 (04): : 379 - 400
[8] HEINEMANN K, 1973, 31ST P EMSA M, P30
[9] MATHEWS JW, 1966, PHILOSOPHICAL MAG, V13, P1207
[10] CO ADSORPTION + INTERACTION WITH OXYGEN ON ( 110 ) NICKEL
PARK, RL
FARNSWORTH, HE
[J]. JOURNAL OF CHEMICAL PHYSICS, 1964, 40 (08) : 2354 - &