ELECTRICAL PROPERTIES OF VAPOR-DEPOSITED SILICON NITRIDE AND SILICON OXIDE FILMS ON SILICON

被引：124

作者：

DEAL, BE

FLEMING, PJ

CASTRO, PL

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1968年 / 115卷 / 03期

关键词：

D O I：

10.1149/1.2411146

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：300 / &

共 25 条

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